Interferometric lithography exposure tool for 180-nm structures

Saleem H. Zaidi; Steven R. J. Brueck; Franklin M. Schellenberg; R. Scott Mackay; K. Uekert; Jeffrey J. Persoff

doi:10.1117/12.275785

7 July 1997 Interferometric lithography exposure tool for 180-nm structures

Saleem H. Zaidi, Steven R. J. Brueck, Franklin M. Schellenberg, R. Scott Mackay, K. Uekert, Jeffrey J. Persoff

Proceedings Volume 3048, Emerging Lithographic Technologies; (1997) https://doi.org/10.1117/12.275785
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

Keywords: interferometric lithography, 300-mm wafer, 1 80-nm CD

Citation Download Citation

Saleem H. Zaidi, Steven R. J. Brueck, Franklin M. Schellenberg, R. Scott Mackay, K. Uekert, and Jeffrey J. Persoff "Interferometric lithography exposure tool for 180-nm structures", Proc. SPIE 3048, Emerging Lithographic Technologies, (7 July 1997); https://doi.org/10.1117/12.275785

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