Vacuum-vapor-deposited films based on benzo(a)phenoxazine derivatives under surface plasma fluorination

Vladimir Enokovich Agabekov; Olga Evgenyevna Ignasheva; Vladimir N. Belyatsky

doi:10.1117/12.275875

7 July 1997 Vacuum-vapor-deposited films based on benzo(a)phenoxazine derivatives under surface plasma fluorination

Vladimir Enokovich Agabekov, Olga Evgenyevna Ignasheva, Vladimir N. Belyatsky

Proceedings Volume 3049, Advances in Resist Technology and Processing XIV; (1997) https://doi.org/10.1117/12.275875
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

Modification of vacuum vapor deposited thin films based on benzo(a)phenoxazone-5 derivatives with C₃F₈ and SF₆ plasma were investigated. X-ray photoelectron spectroscopy (XPS) method was used to identify and study the distribution of surface functional groups of untreated and fluorinated films investigated. It was shown that fluor content in element composition of surface film layers and perfluorocarbon group content in Cls-lines of XP-spectra depended on chemical structure of the initial compounds. The more quantity and size of side substitutes were contained in the compound chemical structure the less was the content of fluor and perfluorocarbon groups in film surface fluorinated layer. The probable way of plasma active particle interaction with film surface is discussed. Using Kaelbe's method the influence of treatment conditions and initial compound chemical structure on surface properties of fluorinated films was studied.

Citation Download Citation

Vladimir Enokovich Agabekov, Olga Evgenyevna Ignasheva, and Vladimir N. Belyatsky "Vacuum-vapor-deposited films based on benzo(a)phenoxazine derivatives under surface plasma fluorination", Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); https://doi.org/10.1117/12.275875

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