Influence of process parameters on the growth of YBCO thin films deposited by excimer laser ablation

R. A. Chakalov; Zdravko G. Ivanov; P. Larsson; Rumen I. Tomov

doi:10.1117/12.262955

27 December 1996 Influence of process parameters on the growth of YBCO thin films deposited by excimer laser ablation

R. A. Chakalov, Zdravko G. Ivanov, P. Larsson, Rumen I. Tomov

Proceedings Volume 3052, Ninth International School on Quantum Electronics: Lasers--Physics and Applications; (1996) https://doi.org/10.1117/12.262955
Event: Ninth International School on Quantum Electronics: Lasers: Physics and Applications, 1996, Varna, Bulgaria

Abstract

The aim of this work was to investigate the growth mechanism of Y₁Ba₂Cu₃O_7-(delta ) thin films prepared by KrF and XeCl excimer laser ablation on different substrate. To investigate the film's properties - morphology, epitaxy, c-axis length and critical temperature (T_c) - we varied the process parameters - oxygen partial pressure, substrate temperature and laser energy density. The films were analyzed by (Theta) -2(Theta) XRD, (phi) -scan XRD, optical microscopy, AFM, prophilometry and electric measurements.

Citation Download Citation

R. A. Chakalov, Zdravko G. Ivanov, P. Larsson, and Rumen I. Tomov "Influence of process parameters on the growth of YBCO thin films deposited by excimer laser ablation", Proc. SPIE 3052, Ninth International School on Quantum Electronics: Lasers--Physics and Applications, (27 December 1996); https://doi.org/10.1117/12.262955

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