Laser-assisted chemical vapor deposition of diamond films

Deming Ren; Xiaoyong Hu; Fengmei M. Liu; Yanchen Qu; Jingshan Zhao

doi:10.1117/12.317961

15 August 1998 Laser-assisted chemical vapor deposition of diamond films

Deming Ren, Xiaoyong Hu, Fengmei M. Liu, Yanchen Qu, Jingshan Zhao

Proceedings Volume 3550, Laser Processing of Materials and Industrial Applications II; (1998) https://doi.org/10.1117/12.317961
Event: Photonics China '98, 1998, Beijing, China

Abstract

In this paper, it is reported that diamond films have been synthesized by the Laser Assisted Chemical Vapor Deposition (LACVD) method using the mixture of acetone and hydrogen. The XeCl excimer laser with a wavelength of 308 nm has been utilized as photo-dissociation energy source for carbohydrate, and H₂ has been predissociated by hot filament at the temperature of 2000 degrees Celsius. P-type silicone was employed as substrate, which temperature was controlled at about 800 degrees Celsius. The specimens deposited by the method of LACVD were analyzed and evaluated by Raman spectroscopy and scanning electronics microscopy (SEM) accordingly. A character peak of diamond films at 1332 cm^-1 can be observed from Raman spectrum. The experimental result have shown that a high-quality diamond film can be obtained.

Citation Download Citation

Deming Ren, Xiaoyong Hu, Fengmei M. Liu, Yanchen Qu, and Jingshan Zhao "Laser-assisted chemical vapor deposition of diamond films", Proc. SPIE 3550, Laser Processing of Materials and Industrial Applications II, (15 August 1998); https://doi.org/10.1117/12.317961

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