2001 and beyond: a challenge for metrology

Syed A. Rizvi

doi:10.1117/12.350845

14 June 1999 2001 and beyond: a challenge for metrology

Syed A. Rizvi

Proceedings Volume 3677, Metrology, Inspection, and Process Control for Microlithography XIII; (1999) https://doi.org/10.1117/12.350845
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

As the industry moves into the next millennium it faces new challenges that are not only in the fabrication of the sub- 150 nm features but also in the ability to measure those features. The focus of this paper is not as much on the building of machines to measure those small features but rather on the methodologies of interpreting and handling of data and developing intelligence for identifying the edge- positions that have significant contribution on the value of the critical dimensions or CDs.

Citation Download Citation

Syed A. Rizvi "2001 and beyond: a challenge for metrology", Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); https://doi.org/10.1117/12.350845

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