Important role of hydroxyethyl derivatives of poly(hydroxystyrene) in the development of advanced negative resists

Pushkara Rao Varanasi; Niranjan Patel

doi:10.1117/12.350177

11 June 1999 Important role of hydroxyethyl derivatives of poly(hydroxystyrene) in the development of advanced negative resists

Pushkara Rao Varanasi, Niranjan Patel

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Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350177
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

In this paper, we present the synthesis, thermal properties, dissolution characteristics and lithographic potential of a new poly(hydroxystyrene) derivative (PHS-EtOH) obtained by blocking the phenolic functionality with a saturated alcohol moiety through an ether linkage. The replacement of PHS with this modified polymer in a negative resist formulation has resulted in a dramatic improvement in dense line resolution.

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Pushkara Rao Varanasi and Niranjan Patel "Important role of hydroxyethyl derivatives of poly(hydroxystyrene) in the development of advanced negative resists", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350177

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