Performance impact of novel polymeric dyes in photoresist applications

Ping-Hung Lu; Salem Mehtsun; John P. Sagan; Jianhui Shan; Eleazar Gonzalez; Shuji Ding; Dinesh N. Khanna

doi:10.1117/12.350175

11 June 1999 Performance impact of novel polymeric dyes in photoresist applications

Ping-Hung Lu, Salem Mehtsun, John P. Sagan, Jianhui Shan, Eleazar Gonzalez, Shuji Ding, Dinesh N. Khanna

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350175
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Dye compounds are commonly used in photoresists as a low cost and effective way to control swing and/or standing wave effect caused by thin film interference as well as reflective notching by reflective light from highly reflective substrate and topography. Convention dyes are typically a monomeric compound with high absorptivity at the wavelength of exposure light and compatible with the resist system selected. Because of the monomeric nature, conventional dyes are relatively low in molecular weight hence their thermal stability and sublimination propensity has always been an issue of concern. We recently synthesize several highly thermal stable diazotized polymeric dyes. Their thermal properties as well as compatibility with resist system were investigated. The impact of polymeric dyes on the resists lithographic performance, swing reduction and reflective notching control are discussed.

Citation Download Citation

Ping-Hung Lu, Salem Mehtsun, John P. Sagan, Jianhui Shan, Eleazar Gonzalez, Shuji Ding, and Dinesh N. Khanna "Performance impact of novel polymeric dyes in photoresist applications", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350175

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