Comparative evaluation results of CMS replacement resist for e-beam reticle fabrication

Hideo Kobayashi; Takao Higuchi; Keishi Asakawa; Yasunori Yokoya; Tetsuya Wada

doi:10.1117/12.360201

25 August 1999 Comparative evaluation results of CMS replacement resist for e-beam reticle fabrication

Hideo Kobayashi, Takao Higuchi, Keishi Asakawa, Yasunori Yokoya, Tetsuya Wada

Proceedings Volume 3748, Photomask and X-Ray Mask Technology VI; (1999) https://doi.org/10.1117/12.360201
Event: Photomask and X-Ray Mask Technology VI, 1999, Yokohama, Japan

Abstract

Looking for a CMS replacement resist is an urgent assignment for e-beam reticle fabrication, which enables us to maintain flexibility of reticle fabrications. CMS-EX series was discontinued in 1995, and its stored resin will be used up completely sooner in this year 1999. We then tried to find a replacement resist, and examined commercially available resist SEL-N1000, SEL-N1100 and ZEN4400. We studied their behavior to post-spin baking temperature respectively, in order to bring out their potential, by investigating isolated clear pattern fidelity in details as it was the most tough one to make by a negative-working resist. This paper describes our comparative evaluation results of commercially available negative-working resists to determine a CMS-EX-S replacement for e-beam reticle fabrication.

Citation Download Citation

Hideo Kobayashi, Takao Higuchi, Keishi Asakawa, Yasunori Yokoya, and Tetsuya Wada "Comparative evaluation results of CMS replacement resist for e-beam reticle fabrication", Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); https://doi.org/10.1117/12.360201

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