Fabrication of counter electrodes for scanning atomic probe

Andrew Campitelli; Hocine Ziad; Frank Rogge; Wilfried Vandervorst; Christiaan Baert; Min Huang; Alfred Cerezo

doi:10.1117/12.361214

30 August 1999 Fabrication of counter electrodes for scanning atomic probe

Andrew Campitelli, Hocine Ziad, Frank Rogge, Wilfried Vandervorst, Christiaan Baert, Min Huang, Alfred Cerezo

Proceedings Volume 3874, Micromachining and Microfabrication Process Technology V; (1999) https://doi.org/10.1117/12.361214
Event: Symposium on Micromachining and Microfabrication, 1999, Santa Clara, CA, United States

Abstract

This paper reports on the fabrication of innovative counter electrodes for the development of a new Scanning Atom Probe (SAP) instrument. A process using thick spin-on dielectrics, deep reactive ion etching and photolithography has been developed for the realization of the counter electrodes. The novel structure is a two-terminal device in the form of a hollow cone shape, with tow electrodes separated by a dielectric layer. Different counter electrode design versions are presented, with the focus on the results for the first iteration. Electrical testing of the insulating layer is performed to investigate the material suitability for the operating conditions of the SAP instrument. Details regarding the design and fabrication procedure for the different designs, with emphasis on the process flow for the non standard steps, are also presented.

Citation Download Citation

Andrew Campitelli, Hocine Ziad, Frank Rogge, Wilfried Vandervorst, Christiaan Baert, Min Huang, and Alfred Cerezo "Fabrication of counter electrodes for scanning atomic probe", Proc. SPIE 3874, Micromachining and Microfabrication Process Technology V, (30 August 1999); https://doi.org/10.1117/12.361214

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