Bake condition effect on hybrid lithography process for negative-tone chemically amplified resists

Laurent Pain; F. Sala; C. Higgins; B. Dal'zotto; Serge V. Tedesco

doi:10.1117/12.388357

23 June 2000 Bake condition effect on hybrid lithography process for negative-tone chemically amplified resists

Laurent Pain, F. Sala, C. Higgins, B. Dal'zotto, Serge V. Tedesco

Proceedings Volume 3999, Advances in Resist Technology and Processing XVII; (2000) https://doi.org/10.1117/12.388357
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

This paper presents the process optimization study of negative tone Chemically Amplified Resists (CAR) under E-Beam exposure. The importance of post apply bake temperature choice on resolution is underlined. The process study determines the process window in which optimal conditions of both post apply and post exposure bake steps are defined and present a method to define more precisely the thermal cross-linking onset. Finally lithographic performances of CARs are studied and we show that resolution can be pushed down to 40 nm.

Citation Download Citation

Laurent Pain, F. Sala, C. Higgins, B. Dal'zotto, and Serge V. Tedesco "Bake condition effect on hybrid lithography process for negative-tone chemically amplified resists", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388357

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