High-yield resin fractionation using a liquid/liquid centrifuge

Stan F. Wanat; M. Dalil Rahman; Balaji Narasimhan; Douglas S. McKenzie; Michelle M. Cook

doi:10.1117/12.388336

23 June 2000 High-yield resin fractionation using a liquid/liquid centrifuge

Stan F. Wanat, M. Dalil Rahman, Balaji Narasimhan, Douglas S. McKenzie, Michelle M. Cook

Proceedings Volume 3999, Advances in Resist Technology and Processing XVII; (2000) https://doi.org/10.1117/12.388336
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Resins used in photoresist manufacturing are often relatively expensive once processing steps (fractionation e.g.) and yield losses are factored into the net cost. We have previously reported on the merits of using an economically more attractive fractionation process using a liquid/liquid centrifuge. Further refinements of this method indicate that waste streams could be reduced by recycling the extractant phase and that lower molecular weight fractions removed from the starting resin might be used in making other resist ingredients [speed enhancers, photoactive compound (PAC) backbones e.g.]. Both of these improvements would reduce the overall manufacturing costs of making resist raw materials and the final products made with them.

Citation Download Citation

Stan F. Wanat, M. Dalil Rahman, Balaji Narasimhan, Douglas S. McKenzie, and Michelle M. Cook "High-yield resin fractionation using a liquid/liquid centrifuge", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388336

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