N2 laser stereo-lithography

Saburoh Satoh; Takao Tanaka; Nobuya Hayashi; Chobei Yamabe

doi:10.1117/12.405746

6 November 2000 N₂ laser stereo-lithography

Saburoh Satoh, Takao Tanaka, Nobuya Hayashi, Chobei Yamabe

Proceedings Volume 4088, First International Symposium on Laser Precision Microfabrication; (2000) https://doi.org/10.1117/12.405746
Event: First International Symposium on Laser Precision Microfabrication (LPM2000), 2000, Omiya, Saitama, Japan

Abstract

A number of pulsed and/or continuous wave lasers are applied in stereo-lithography. In particular, the He-Cd laser and Ar ion laser with a wavelength of 325nm and 351/364nm respectively are used as ultraviolet (UV) light source. Disadvantages of these lasers include inefficient output energy, which is less that 0.1%, large machine size, insufficient output power, and they are very expensive. In the near future, these lasers are expected to increasingly lack the requested performance for higher speed stereo- lithography systems. Moreover, there will be growing demands for lower cost apparatus. For the laser stereo- lithography, the N2 laser with cylindrical tube has been adopted to achieve a lower cost type UV light source. Because of its excellent output efficiency, it is expected to downsize the power supply and laser head, and allows air- cooling. Moreover we adopt an optical fiber system for its optics, because the N2 laser output beam divergence has an excessive. In view of this, attempts were made to develop a special design cylindrical tube as the UV light source. This paper reports the fundamental characteristics of this laser.

Citation Download Citation

Saburoh Satoh, Takao Tanaka, Nobuya Hayashi, and Chobei Yamabe "N₂ laser stereo-lithography", Proc. SPIE 4088, First International Symposium on Laser Precision Microfabrication, (6 November 2000); https://doi.org/10.1117/12.405746

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