Raman spectroscopy: a multifunctional analysis tool for microelectronics manufacturing

Lynette K. Ballast; Tim Z. Hossain; Alan Campion

doi:10.1117/12.410082

23 August 2000 Raman spectroscopy: a multifunctional analysis tool for microelectronics manufacturing

Lynette K. Ballast, Tim Z. Hossain, Alan Campion

Proceedings Volume 4182, Process Control and Diagnostics; (2000) https://doi.org/10.1117/12.410082
Event: Microelectronic Manufacturing, 2000, Santa Clara, CA, United States

Abstract

We have established several applications for the use of Raman spectroscopy in the microelectronics-manufacturing environment. The two primary applications are 1) monitoring thin films and 2) analyzing contaminants. Thin film applications include monitoring cobalt silicide phase transformation and thickness, and crystallinity changes in polysilicon. The same instrument has been used to collect fingerprint Raman spectra of contaminants that can be identified by matching to library or bulk materials spectra.

Citation Download Citation

Lynette K. Ballast, Tim Z. Hossain, and Alan Campion "Raman spectroscopy: a multifunctional analysis tool for microelectronics manufacturing", Proc. SPIE 4182, Process Control and Diagnostics, (23 August 2000); https://doi.org/10.1117/12.410082

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