Reliability of polysilicon thin film transistors on stainless steel foil substrates

Themis Afentakis; Miltiadis K. Hatalis

doi:10.1117/12.424863

30 April 2001 Reliability of polysilicon thin film transistors on stainless steel foil substrates

Themis Afentakis, Miltiadis K. Hatalis

Proceedings Volume 4295, Flat Panel Display Technology and Display Metrology II; (2001) https://doi.org/10.1117/12.424863
Event: Photonics West 2001 - Electronic Imaging, 2001, San Jose, CA, United States

Abstract

We have successfully fabricated polysilicon thin film transistors on a flexible stainless steel foil substrate. Both - and p-channel devices have been subjected to DC and AC voltage stressing, in order to provide for a basic measurement of their performance. We have compared these characteristics with results obtained from devices we have previously fabricated on quartz substrates, and have found no evidence that the stainless steel substrate has affected the reliability of the transistors. We therefore believe that polysilicon devices and circuits on steel present an attractive alternative to transistors fabricated on more expensive substrates, without any reliability compromise.

Citation Download Citation

Themis Afentakis and Miltiadis K. Hatalis "Reliability of polysilicon thin film transistors on stainless steel foil substrates", Proc. SPIE 4295, Flat Panel Display Technology and Display Metrology II, (30 April 2001); https://doi.org/10.1117/12.424863

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