Extended ATHENA alignment performance and application for the 100-nm technology node

Ramon Navarro; Stefan Keij; Arie J. den Boef; Sicco Schets; Frank van Bilsen; Geert Simons; Ron Schuurhuis; Jaap Burghoorn

doi:10.1117/12.436795

22 August 2001 Extended ATHENA alignment performance and application for the 100-nm technology node

Ramon Navarro, Stefan Keij, Arie J. den Boef, Sicco Schets, Frank van Bilsen, Geert Simons, Ron Schuurhuis, Jaap Burghoorn

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Proceedings Volume 4344, Metrology, Inspection, and Process Control for Microlithography XV; (2001) https://doi.org/10.1117/12.436795
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

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Ramon Navarro, Stefan Keij, Arie J. den Boef, Sicco Schets, Frank van Bilsen, Geert Simons, Ron Schuurhuis, and Jaap Burghoorn "Extended ATHENA alignment performance and application for the 100-nm technology node", Proc. SPIE 4344, Metrology, Inspection, and Process Control for Microlithography XV, (22 August 2001); https://doi.org/10.1117/12.436795

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