PLD of metal insulator and relaxor electroceramic thin films

Robert M. Bowman; Gustau Catalan; Michael H. Corbett; Dierdre O'Neill; J. Marty Gregg

doi:10.1117/12.425148

9 April 2001 PLD of metal insulator and relaxor electroceramic thin films

Robert M. Bowman, Gustau Catalan, Michael H. Corbett, Dierdre O'Neill, J. Marty Gregg

Proceedings Volume 4397, 11th International School on Quantum Electronics: Laser Physics and Applications; (2001) https://doi.org/10.1117/12.425148
Event: 11th International School on Quantum Electronics: Laser Physics and Applications, 2000, Varna, Bulgaria

Abstract

In this paper we describe the use of pulsed laser deposition (PLD) for the growth of thin film V_xO_y, NdNiO3 and Pb(Mg_1/3Nb_2/3)O₃. We begin by briefly describing our growth system. By showing case studies of the three materials systems we identify some important aspects and conditions that we believe are of crucial importance to oxide film growth in general.

Citation Download Citation

Robert M. Bowman, Gustau Catalan, Michael H. Corbett, Dierdre O'Neill, and J. Marty Gregg "PLD of metal insulator and relaxor electroceramic thin films", Proc. SPIE 4397, 11th International School on Quantum Electronics: Laser Physics and Applications, (9 April 2001); https://doi.org/10.1117/12.425148

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