Laser ablation of nitrogen-solid films by UV ps-laser irradiation: surface modification of materials by fragments in laser ablation plume

Hiroyuki Niino; Tadatake Sato; Aiko Narazaki; Yoshizo Kawaguchi; Akira Yabe

doi:10.1117/12.470615

18 June 2002 Laser ablation of nitrogen-solid films by UV ps-laser irradiation: surface modification of materials by fragments in laser ablation plume

Hiroyuki Niino, Tadatake Sato, Aiko Narazaki, Yoshizo Kawaguchi, Akira Yabe

Author Affiliations +

Proceedings Volume 4637, Photon Processing in Microelectronics and Photonics; (2002) https://doi.org/10.1117/12.470615
Event: High-Power Lasers and Applications, 2002, San Jose, California, United States

Abstract

Laser ablation of nitrogen solid film deposited on a copper plate at 10 K was investigated by the irradiation of a picosecond UV laser at 263 nm in vacuum. Photo-dissociation of nitrogen molecule in the solid film was confirmed by the optical emissions, which were ascribed to atomic nitrogen, during the laser irradiation at the fluence of 5 J cm^-2 pulse^-1. This photolysis was discussed by the comparison with laser-induced breakdown of nitrogen gas. At the fluence over ca. 10 J cm^-2 pulse^-1, the ablation of the frozen nitrogen film was observed. Employing the ablation plume including a reactive species such as nitrogen atoms, the surface reaction of a graphite oriented pyrolytic graphite plate and silicon wafer was studied. XPS analysis indicated that nitrides were formed on the surfaces by the treatment. The ps-laser ablation of nitrogen solid film provides a novel technique for surface modification of materials.

Citation Download Citation

Hiroyuki Niino, Tadatake Sato, Aiko Narazaki, Yoshizo Kawaguchi, and Akira Yabe "Laser ablation of nitrogen-solid films by UV ps-laser irradiation: surface modification of materials by fragments in laser ablation plume", Proc. SPIE 4637, Photon Processing in Microelectronics and Photonics, (18 June 2002); https://doi.org/10.1117/12.470615

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