Fully automated interference lithography

Bruce D. McLeod; Adam F. Kelsey; Mark A. Leclerc; Daniel P. Resler; Sergey Liberman; James P. Nole

doi:10.1117/12.472277

1 July 2002 Fully automated interference lithography

Bruce D. McLeod, Adam F. Kelsey, Mark A. Leclerc, Daniel P. Resler, Sergey Liberman, James P. Nole

Proceedings Volume 4688, Emerging Lithographic Technologies VI; (2002) https://doi.org/10.1117/12.472277
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Interferometric Lithography has long been considered a viable means to achieve sub-micron resolution lithography over large areas without the use of traditional photomasks. However, traditional IL configurations set up in laboratories on optical isolation tables requires sophisticated optical designs and are greatly limited in both throughput and yield due to these complexities and manual configurations. The Microphotonics Group at OSC has introduced a series of fully automated interference lithography based tool systems that can achieve resolution down to 190 nm period and address a multitude of applications requiring sub-micron resolution in a high- throughput, stabile, manufacturing environment.

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Bruce D. McLeod, Adam F. Kelsey, Mark A. Leclerc, Daniel P. Resler, Sergey Liberman, and James P. Nole "Fully automated interference lithography", Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); https://doi.org/10.1117/12.472277

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