Large-field ion optics for projection and proximity printing and for maskless lithography (ML2)

Hans Loeschner; Gerhard Stengl; Herbert Buschbeck; A. Chalupka; Gertraud Lammer; Elmar Platzgummer; Herbert Vonach; Patrick W.H. de Jager; Rainer Kaesmaier; Albrecht Ehrmann; Stefan Hirscher; Andreas Wolter; Andreas Dietzel; Ruediger Berger; Hubert Grimm; Bruce D. Terris; Wilhelm H. Bruenger; Dieter Adam; Michael Boehm; Hans Eichhorn; Reinhard Springer; Joerg Butschke; Florian Letzkus; Paul Ruchhoeft; John Charles Wolfe

doi:10.1117/12.472336

1 July 2002 Large-field ion optics for projection and proximity printing and for maskless lithography (ML2)

Hans Loeschner, Gerhard Stengl, Herbert Buschbeck, A. Chalupka, Gertraud Lammer, Elmar Platzgummer, Herbert Vonach, Patrick W.H. de Jager, Rainer Kaesmaier, Albrecht Ehrmann, Stefan Hirscher, Andreas Wolter, Andreas Dietzel, Ruediger Berger, Hubert Grimm, Bruce D. Terris, Wilhelm H. Bruenger, Dieter Adam, Michael Boehm, Hans Eichhorn, Reinhard Springer, Joerg Butschke, Florian Letzkus, Paul Ruchhoeft, John Charles Wolfe

Author Affiliations +

Proceedings Volume 4688, Emerging Lithographic Technologies VI; (2002) https://doi.org/10.1117/12.472336
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Recent studies carried out with Infineon Technologies have shown the utility of Ion Projection Lithography (IPL) for the manufacturing of integrated circuits. In cooperation with IBM Storage Technology Division the patterning of magnetic films by resist-less Ion Projection Direct Structuring (IPDS) has been demonstrated. With masked ion beam proximity techniques unique capabilities for lithography on non-planar (curved) surfaces are outlined. Designs are presented for a masked ion beam proximity lithography (MIBPL) exposure tool with sub - 20 nm resolution capability within 88 mmo exposure fields. The possibility of extremely high reduction ratios (200:1) for high-volume ion projection mask-less lithography (IP-ML2) is discussed.

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Hans Loeschner, Gerhard Stengl, Herbert Buschbeck, A. Chalupka, Gertraud Lammer, Elmar Platzgummer, Herbert Vonach, Patrick W.H. de Jager, Rainer Kaesmaier, Albrecht Ehrmann, Stefan Hirscher, Andreas Wolter, Andreas Dietzel, Ruediger Berger, Hubert Grimm, Bruce D. Terris, Wilhelm H. Bruenger, Dieter Adam, Michael Boehm, Hans Eichhorn, Reinhard Springer, Joerg Butschke, Florian Letzkus, Paul Ruchhoeft, and John Charles Wolfe "Large-field ion optics for projection and proximity printing and for maskless lithography (ML2)", Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); https://doi.org/10.1117/12.472336

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