Adjustment of optical proximity correction (OPC) software for mask process correction (MPC): Module 2. Lithography simulation based on optical mask writing tool simulation

Alexandra Barberet; Peter D. Buck; Gilles L. Fanget; Olivier Toublan; Jean-Charles Richoilley; Michel Tissier

doi:10.1117/12.476988

1 August 2002 Adjustment of optical proximity correction (OPC) software for mask process correction (MPC): Module 2. Lithography simulation based on optical mask writing tool simulation

Alexandra Barberet, Peter D. Buck, Gilles L. Fanget, Olivier Toublan, Jean-Charles Richoilley, Michel Tissier

Author Affiliations +

Proceedings Volume 4754, Photomask and Next-Generation Lithography Mask Technology IX; (2002) https://doi.org/10.1117/12.476988
Event: Photomask and Next Generation Lithography Mask Technology IX, 2002, Yokohama, Japan

Abstract

We develop a Mask Process Correction (MPC) set of tools in collaboration with DuPont Photomasks, Mentor Graphics and CEA-LETI. The MPC project consists of 3 modules.

Citation Download Citation

Alexandra Barberet, Peter D. Buck, Gilles L. Fanget, Olivier Toublan, Jean-Charles Richoilley, and Michel Tissier "Adjustment of optical proximity correction (OPC) software for mask process correction (MPC): Module 2. Lithography simulation based on optical mask writing tool simulation", Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); https://doi.org/10.1117/12.476988

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