Paper
2 September 2003 Novel high-precision optical thin film monitor
Cheng Zhang, Weiqiang Lu, Yongtian Wang
Author Affiliations +
Proceedings Volume 5253, Fifth International Symposium on Instrumentation and Control Technology; (2003) https://doi.org/10.1117/12.521691
Event: Fifth International Symposium on Instrumentation and Control Technology, 2003, Beijing, China
Abstract
High-precision optical thin-film deposition monitor is a key technology for modern optical thin-film fabrication. A new monitor is developed based on double beam one lock-in amplifier. It allows the precise cut off of layers through the deposition. Experimental results show that the monitor can be used in a high-precision, fully automatic control optical thin-film deposition system.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Cheng Zhang, Weiqiang Lu, and Yongtian Wang "Novel high-precision optical thin film monitor", Proc. SPIE 5253, Fifth International Symposium on Instrumentation and Control Technology, (2 September 2003); https://doi.org/10.1117/12.521691
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KEYWORDS
Thin films

Optical amplifiers

Sensors

Thin film deposition

Lamps

Modulation

Precision optics

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