Full optical column characterization of DUV lithographic projection tools

Mark A. van de Kerkhof; Wim de Boeij; Haico Kok; Marianna Silova; Jan Baselmans; Marcel Hemerik

doi:10.1117/12.536331

28 May 2004 Full optical column characterization of DUV lithographic projection tools

Mark A. van de Kerkhof, Wim de Boeij, Haico Kok, Marianna Silova, Jan Baselmans, Marcel Hemerik

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.536331
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Advanced optical systems for low k₁ lithography require accurate characterisation of various imaging parameters to insure that OPC strategies can be maintained. Among these parameters lens aberrations and illumination profiles are the most important optical column charcteristics. The phase measurement interferometer hardware (ILIAS: Integrated Lens Interferometer At Scanner) integrated into high-NA ArF lithographic projection tools opens novel pathways to measure and control tool critical performance parameters. In this presentation we address new extensions of this in-line tool that will allow the measurement of optical parameters of the full optical column. The primary functionality of the ILIAS system is to measure and analyse wavefront aberrations across the full image field with high accuracy and speed. In this paper performance data of the in-line wavefront sensor over multiple high-NA ArF lithographic systems is presented. In addition to the acquisition of wavefront aberrations in terms of Zernike polynomials, detailed measurements of high resolution wavefronts are now possible. Examples of such wavefronts and PSD analysis thereof are presented. Besides the projection lens properties, the detailed shape of the pupil distribution and transmission (apodisation) becomes critical for system optimization. The integrated ILIAS hardware can also be used to measure these parameters.

Citation Download Citation

Mark A. van de Kerkhof, Wim de Boeij, Haico Kok, Marianna Silova, Jan Baselmans, and Marcel Hemerik "Full optical column characterization of DUV lithographic projection tools", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.536331

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available