New advanced lithography tools with mix-and-match strategy

Jun Ishikawa; Masahiro Nei; Masato Hamatani; Shinji Wakamoto; Toshikazu Umatate

doi:10.1117/12.537214

28 May 2004 New advanced lithography tools with mix-and-match strategy

Jun Ishikawa, Masahiro Nei, Masato Hamatani, Shinji Wakamoto, Toshikazu Umatate

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.537214
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Nikon has developed cutting-edge lithography tools, and its product lineup encompasses all exposure wavelengths. They are: the NSR-S307E ArF scanner for the 90nm node; the NSR-S207D KrF scanner for the 110nm node; the NSR-SF130 i-line stepper for the middle layer and the new concept NSR-SF200 KrF stepper, which offers unparalleled productivity and cost performance. In addition, a powerful support system is provided, the Lithography Equipment Engineering System, which will allow its customers to use all of these exposure tools simultaneously and derive the maximum benefit of the mix-and-match strategy. The use of this system will increase the uptime and enable their combined performance to exceed that of a stand-alone tool.Latest actual performance data from each of the tools and the result of the optimization performed using application software will be reported.

Citation Download Citation

Jun Ishikawa, Masahiro Nei, Masato Hamatani, Shinji Wakamoto, and Toshikazu Umatate "New advanced lithography tools with mix-and-match strategy", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.537214

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