Polyimide coating texture development by ECR-plasma etching

Petr G. Babaevsky; Andrey A. Zhukov; Svetlana A. Zhukova; Yury S. Tchetverov; Sergei Yu. Shapoval

doi:10.1117/12.552179

1 March 2004 Polyimide coating texture development by ECR-plasma etching

Petr G. Babaevsky, Andrey A. Zhukov, Svetlana A. Zhukova, Yury S. Tchetverov, Sergei Yu. Shapoval

Proceedings Volume 5398, Sixth Seminar on Problems of Theoretical and Applied Electron and Ion Optics; (2004) https://doi.org/10.1117/12.552179
Event: Sixth Seminar on Problems of Theoretical and Applied Electron and Ion Optics, 2003, Moscow, Russian Federation

Abstract

Effect of chemical composition and imidization temperature of thin polyimide coatings on etching rate in oxygen plasma generated by electron cyclotron resonance source at different bias voltage potential (ion energy) and time of the process was studied. A correlation of plasmochemical etching rate and topology pattern profile of the polyimide coatings at different etching conditions was determined.

Citation Download Citation

Petr G. Babaevsky, Andrey A. Zhukov, Svetlana A. Zhukova, Yury S. Tchetverov, and Sergei Yu. Shapoval "Polyimide coating texture development by ECR-plasma etching", Proc. SPIE 5398, Sixth Seminar on Problems of Theoretical and Applied Electron and Ion Optics, (1 March 2004); https://doi.org/10.1117/12.552179

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