Influence of process parameters on fabrication of PZT(53/47) thick films by a dip-coating process

Xiyun He; Yong Zhang; Pingsun Qiu; Aili Ding

doi:10.1117/12.607370

8 December 2004 Influence of process parameters on fabrication of PZT(53/47) thick films by a dip-coating process

Xiyun He, Yong Zhang, Pingsun Qiu, Aili Ding

Proceedings Volume 5774, Fifth International Conference on Thin Film Physics and Applications; (2004) https://doi.org/10.1117/12.607370
Event: Fifth International Conference on Thin Film Physics and Applications, 2004, Shanghai, China

Abstract

Crack-free polycrystalline PbZr_0.53Ti_0.47O₃ (PZT(53/47) thick films (1~30μm) with peroviskite structure have been prepared from a dip-coating process. The influence of withdrawal speed and precursor solution concentration on the morphology of the films was examined. The effects of the substrate characteristics on the film phase structure and microstructure were investigated and evaluated. The ferroelectric and dielectric properties have been examined and discussed. PZT (53/47) thick films on Pt/Ti/SiO₂ wafer and Pt/Ti foil substrates all exhibit excellent electric properties, Pr: 32~34 μmC/cm²; Ec: 32~35kV/cm, ε_r 900~940; tanδ: 0.02~0.04. These materials promise a good application in micro-devices including micro-pump, micro-actuator, etc.

Citation Download Citation

Xiyun He, Yong Zhang, Pingsun Qiu, and Aili Ding "Influence of process parameters on fabrication of PZT(53/47) thick films by a dip-coating process", Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); https://doi.org/10.1117/12.607370

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