Paper
23 March 2005 Enhancement of EUV emission from a liquid microjet target by use of dual laser pulses
Takeshi Higashiguchi, Chirag Rajyaguru, Masato Koga, Keita Kawasaki, Wataru Sasaki, Shoichi Kubodera, Takashi Kikuchi, Noboru Yugami, Shigeo Kawata, Alexander A. Andreev
Author Affiliations +
Proceedings Volume 5777, XV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; (2005) https://doi.org/10.1117/12.611202
Event: XV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 2004, Prague, Czech Republic
Abstract
Extreme ultraviolet (EUV) radiation at the wavelength of around 13nm waws observed from a laser-produced plasma using continuous water-jet. Strong dependence of the conversion efficiency (CE) on the laser focal spot size and jet diameter was observed. The EUV CE at a given laser spot size and jet diameter was further enhanced using double laser pulses, where a pre-pulse was used for initial heating of the plasma.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takeshi Higashiguchi, Chirag Rajyaguru, Masato Koga, Keita Kawasaki, Wataru Sasaki, Shoichi Kubodera, Takashi Kikuchi, Noboru Yugami, Shigeo Kawata, and Alexander A. Andreev "Enhancement of EUV emission from a liquid microjet target by use of dual laser pulses", Proc. SPIE 5777, XV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, (23 March 2005); https://doi.org/10.1117/12.611202
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KEYWORDS
Extreme ultraviolet

Plasma

Pulsed laser operation

Liquids

Picosecond phenomena

Electronics engineering

Extreme ultraviolet lithography

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