Paper
5 October 2005 Anomalous influence of electrons diffusion on absorption optical bistability realization
Vyacheslav A. Trofimov, Maria M. Loginova
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Abstract
An influence of electrons diffusion on the intensities of switching for absorption optical bistability based on high-intensity femtosecond laser pulse interaction with semiconductor is studied. The dependence of absorption coefficient on free electrons concentration and on induced electric field strength or its potential is considered. With the help of computer simulation an anomalous influence of electrons diffusion on intensities of switching under taking into account of free electrons mobility.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vyacheslav A. Trofimov and Maria M. Loginova "Anomalous influence of electrons diffusion on absorption optical bistability realization", Proc. SPIE 5949, Nonlinear Optics Applications, 59490H (5 October 2005); https://doi.org/10.1117/12.622445
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CITATIONS
Cited by 3 scholarly publications.
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KEYWORDS
Electrons

Switching

Diffusion

Semiconductors

Absorption

Bistability

Computer simulations

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