New development application method to improve critical dimension control

Chang-Young Hong

doi:10.1117/12.655116

29 March 2006 New development application method to improve critical dimension control

Chang-Young Hong

Proceedings Volume 6153, Advances in Resist Technology and Processing XXIII; 615338 (2006) https://doi.org/10.1117/12.655116
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

As critical dimension shrink below 0.13um at the using KrF resists, critical dimension control becomes a major concern. development is one of the critical processes affecting CD control. We have focused attention on the stage of TMAH puddle & velopment formation. How to fast develop solution percolates through the exposured area was the key to expanding the process latitude and CD uniformity. Our investigated new development method was provided this key factor. In this paper, we compared with standard development method and our proposed new double development method. and it was found that the process latitude, CD uniformity of within-wafer and within-line pattern, the profile of the top of the pattern were improved by New development method for various pattern features.

Citation Download Citation

Chang-Young Hong "New development application method to improve critical dimension control", Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 615338 (29 March 2006); https://doi.org/10.1117/12.655116

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available