Continuous writing technique of long gratings for metrological applications

Emilie Gamet; Yves Jourlin; Stéphanie Reynaud; Jean-Claude Pommier; Olivier Parriaux

doi:10.1117/12.662207

27 April 2006 Continuous writing technique of long gratings for metrological applications

Emilie Gamet, Yves Jourlin, Stéphanie Reynaud, Jean-Claude Pommier, Olivier Parriaux

Proceedings Volume 6188, Optical Micro- and Nanometrology in Microsystems Technology; 618808 (2006) https://doi.org/10.1117/12.662207
Event: SPIE Photonics Europe, 2006, Strasbourg, France

Abstract

The method presented here is an optical technique allowing the high productivity printing of long submicron period gratings by means of a phase mask illuminated by an intensity modulated laser beam. The continuous writing of the grating permits to avoid stitching errors and the fabrication of very long gratings. The main applications concern the fabrication of long optical scales for high resolution optical encoders. The experimental results presented here show 100 mm long resist gratings with 500 nm period.

Citation Download Citation

Emilie Gamet, Yves Jourlin, Stéphanie Reynaud, Jean-Claude Pommier, and Olivier Parriaux "Continuous writing technique of long gratings for metrological applications", Proc. SPIE 6188, Optical Micro- and Nanometrology in Microsystems Technology, 618808 (27 April 2006); https://doi.org/10.1117/12.662207

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