More evolved PGSD (proximity gap suction developer) for controlling movement of dissolution products

Hideaki Sakurai; Yukio Oppata; Koji Murano; Mari Sakai; Masamitsu Itoh; Hidehiro Watanabe; Hideo Funakoshi; Kotaro Ooishi; Yoshiki Okamoto; Masatoshi Kaneda; Shigenori Kamei; Naoya Hayashi

doi:10.1117/12.685740

20 October 2006 More evolved PGSD (proximity gap suction developer) for controlling movement of dissolution products

Hideaki Sakurai, Yukio Oppata, Koji Murano, Mari Sakai, Masamitsu Itoh, Hidehiro Watanabe, Hideo Funakoshi, Kotaro Ooishi, Yoshiki Okamoto, Masatoshi Kaneda, Shigenori Kamei, Naoya Hayashi

Author Affiliations +

Proceedings Volume 6349, Photomask Technology 2006; 63494J (2006) https://doi.org/10.1117/12.685740
Event: SPIE Photomask Technology, 2006, Monterey, California, United States

Abstract

PGSD is one of the solutions as a developer of 70 nm node generation mask fabrication. To make 55 nm node generation mask, CD error induced by loading effect (loading-effect-induced CD error) must be reduced. As is generally known, primary cause of loading effect is dissolution products that hinder the progress of development. We think that it is the key in development technology to control movement of dissolution products and to disperse dissolution products uniformly for minimizing the loading-effect-induced CD error. In this paper, we propose a new concept and procedure to optimize the movement direction and the amount of dissolution products.

Citation Download Citation

Hideaki Sakurai, Yukio Oppata, Koji Murano, Mari Sakai, Masamitsu Itoh, Hidehiro Watanabe, Hideo Funakoshi, Kotaro Ooishi, Yoshiki Okamoto, Masatoshi Kaneda, Shigenori Kamei, and Naoya Hayashi "More evolved PGSD (proximity gap suction developer) for controlling movement of dissolution products", Proc. SPIE 6349, Photomask Technology 2006, 63494J (20 October 2006); https://doi.org/10.1117/12.685740

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