Thermal and storage degradation of SiOx orienting films and its influence on NLCs alignment

Yu. Kolomzarov; P. Oleksenko; V. Sorokin; P. Tytarenko; R. Zelinskyy

doi:10.1117/12.742660

24 May 2007 Thermal and storage degradation of SiO_x orienting films and its influence on NLCs alignment

Yu. Kolomzarov, P. Oleksenko, V. Sorokin, P. Tytarenko, R. Zelinskyy

Proceedings Volume 6637, XV International Symposium on Advanced Display Technologies; 663709 (2007) https://doi.org/10.1117/12.742660
Event: XV International Symposium on Advanced Display Technologies, 2006, Moscow, Russian Federation

Abstract

Thermal and degradation stability of SiO_x aligning films deposited by reactive cathode sputtering (RCS) in glow discharge plasma has been investigated. It is shown that heat treatment and other external factors initiate transformations on the surface of aligning film and formed new conditions on the interface. It is lead to change of easy axis orientation direction of LC molecules and appearance of various defects in the LC aligned structures. The technological ways for increasing of aligning layers durability under influence of external factors has been proposed.

Citation Download Citation

Yu. Kolomzarov, P. Oleksenko, V. Sorokin, P. Tytarenko, and R. Zelinskyy "Thermal and storage degradation of SiO_x orienting films and its influence on NLCs alignment", Proc. SPIE 6637, XV International Symposium on Advanced Display Technologies, 663709 (24 May 2007); https://doi.org/10.1117/12.742660

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