Influence of process conditions on the optical properties of HfO2/SiO2 coatings for high-power laser coatings

B. Langdon; D. Patel; E. Krous; J. J. Rocca; C. S. Menoni; F. Tomasel; S. Kholi; P. R. McCurdy; Peter Langston; Albert Ogloza

doi:10.1117/12.753027

16 January 2008 Influence of process conditions on the optical properties HfO₂/SiO₂ thin films for high power laser coatings

B. Langdon, D. Patel, E. Krous, J. J. Rocca, C. S. Menoni, F. Tomasel, S. Kholi, P. R. McCurdy, Peter Langston, Albert Ogloza

Author Affiliations +

Proceedings Volume 6720, Laser-Induced Damage in Optical Materials: 2007; 67200X (2008) https://doi.org/10.1117/12.753027
Event: Boulder Damage Symposium XXXIX: Annual Symposium on Optical Materials for High Power Lasers, 2007, Boulder, Colorado, United States

Abstract

We investigate the variations that occur with changes in the number of layers and with the use of the assist beam main and assist beam energy on the morphology of HfO₂/SiO₂ quarter wave stacks deposited by dual ion beam sputtering. We show how the addition of sequential HfO₂/SiO₂ bilayers, up to eight, affects the surface roughness and micro-crystallinity of the top HfO₂ layer. We also show that use of the assist source significantly smooths the surface while simultaneously reducing microcrystallinity. The HfO₂/SiO₂ structures are very robust and can withstand fluences in excess of 3 J/cm² generated by 1ps pulses from a chirped amplified Ti:Sapphire laser.

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B. Langdon, D. Patel, E. Krous, J. J. Rocca, C. S. Menoni, F. Tomasel, S. Kholi, P. R. McCurdy, Peter Langston, and Albert Ogloza "Influence of process conditions on the optical properties HfO₂/SiO₂ thin films for high power laser coatings", Proc. SPIE 6720, Laser-Induced Damage in Optical Materials: 2007, 67200X (16 January 2008); https://doi.org/10.1117/12.753027

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