Paper
29 April 2008 Direct measurement of the linewidth of relief element on AFM in nanometer range
Yu. A. Novikov, M. N. Filippov, I. D. Lysov, A. V. Rakov, V. A. Sharonov, P. A. Todua
Author Affiliations +
Proceedings Volume 7025, Micro- and Nanoelectronics 2007; 702510 (2008) https://doi.org/10.1117/12.802427
Event: Micro- and Nanoelectronics 2007, 2007, Zvenigorod, Russian Federation
Abstract
The article includes the results of the study of image formation in atomic force microscope (AFM). The influence of radius and angle characteristics of cantilever tip as well as the relief of the surface studied on the signal waveform is shown. The authors demonstrate the techniques of AFM calibration and direct measurement of linear sizes of trapezoid structures including the line width with the use of AFM signal and its first derivative. There were obtained the equations establishing relations the sizes of trapezoid structures with the sizes of test segments chosen on AFM signals.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yu. A. Novikov, M. N. Filippov, I. D. Lysov, A. V. Rakov, V. A. Sharonov, and P. A. Todua "Direct measurement of the linewidth of relief element on AFM in nanometer range", Proc. SPIE 7025, Micro- and Nanoelectronics 2007, 702510 (29 April 2008); https://doi.org/10.1117/12.802427
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Cited by 2 scholarly publications.
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KEYWORDS
Atomic force microscopy

Calibration

Optical spheres

Scanning electron microscopy

Solids

Stereolithography

Atomic force microscope

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