Atomic layer epitaxy of TiO2/ZnO multilayers for water-window attosecond optics

Yuji Tanaka; Yusuke Masuda; Hiroshi Kumagai; Tsutomu Shinagawa; Ataru Kobayasi

doi:10.1117/12.808169

24 February 2009 Atomic layer epitaxy of TiO₂/ZnO multilayers for water-window attosecond optics

Yuji Tanaka, Yusuke Masuda, Hiroshi Kumagai, Tsutomu Shinagawa, Ataru Kobayasi

Proceedings Volume 7201, Laser Applications in Microelectronic and Optoelectronic Manufacturing VII; 72010Z (2009) https://doi.org/10.1117/12.808169
Event: SPIE LASE: Lasers and Applications in Science and Engineering, 2009, San Jose, California, United States

Abstract

The development of high-reflection multilayer mirrors in the "water window" (λ=2.3-4.4nm) is desired for attosecond soft x-ray optics. TiO₂/ZnO multilayer mirrors were proposed in this study as highly reflective coatings for the water window wavelength region. The theoretical calculation on the layer combination indicated that the high reflectivity of approximately 50% at 2.73 nm was obtainable at the incidence angle of 18.2° from the normal incidence. The ZnO and TiO₂ thin films were grown using atomic layer epitaxy (ALE) methods at 450°C. Experimental results indicated that both the crystalline rutile TiO₂ (200) and wurtzite ZnO (0001) thin films both were grown epitaxially on Al₂O₃ (0001) substrates by ALE. Moreover, a 10-bilayer TiO₂/ZnO multilayer showed the soft X-ray reflectivity of around 10%.

Citation Download Citation

Yuji Tanaka, Yusuke Masuda, Hiroshi Kumagai, Tsutomu Shinagawa, and Ataru Kobayasi "Atomic layer epitaxy of TiO₂/ZnO multilayers for water-window attosecond optics", Proc. SPIE 7201, Laser Applications in Microelectronic and Optoelectronic Manufacturing VII, 72010Z (24 February 2009); https://doi.org/10.1117/12.808169

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