Error-budget paradigms and laser mask pattern generator evolution

H. Christopher Hamaker; Matthew J. Jolley; Andrew D. Berwick

doi:10.1117/12.835194

27 May 2009 Error-budget paradigms and laser mask pattern generator evolution

H. Christopher Hamaker, Matthew J. Jolley, Andrew D. Berwick

Proceedings Volume 7470, 25th European Mask and Lithography Conference; 74700W (2009) https://doi.org/10.1117/12.835194
Event: 25th European Mask and Lithography Conference, 2009, Dresden, Germany

Abstract

The evolution of the ALTA^(R) series of laser mask pattern generators has increased the relative contribution of intensity errors on critical-dimension (CD) control to those from placement errors. This paradigm shift has driven a change in rasterization strategy wherein aerial image sharpness is improved at the cost of a slight decrease in the averaging of column-to-column placement errors. Print performance evaluation using small-area CD test patterns show improvements in stripe-axis local CD uniformity (CDU) 3σ values of 15-25% using the new strategy, and systematic brush-error contributions were reduced by 50%. The increased importance of intensity errors, coupled with the improvement of ALTA system performance, has also made the mask-blank and process-induced errors a more significant part of the overall error budget. A simple model based on two components, a pattern-invariant footprint and one related to the exposure density ρ(x, y), is shown to describe adequately the errors induced by these sources. The first component is modeled by a fourth-order, two-dimensional polynomial, whereas the second is modeled as a convolution of ρ(x, y) with one or more Gaussian kernels. Implementation of this model on the ALTA 4700 system shows improvements in global CDU of 50%.

Citation Download Citation

H. Christopher Hamaker, Matthew J. Jolley, and Andrew D. Berwick "Error-budget paradigms and laser mask pattern generator evolution", Proc. SPIE 7470, 25th European Mask and Lithography Conference, 74700W (27 May 2009); https://doi.org/10.1117/12.835194

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KEYWORDS

Supercontinuum generation

Printing

Critical dimension metrology

Convolution

Calibration

Photomasks

Etching

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