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Nanosecond-pulse UV-laser-damage initiation in multilayer coatings comprised from metal oxide as a high-index
component, and silica oxide as a low-index material, is strongly linked to metal oxide. The nature of the absorbing
species and their physical properties remain unknown because of extremely small sizes. Previous experimental evidence
provided by high-resolution mapping of damage morphology points to a few-nanometer scale of these absorbers. This
work demonstrates submicrometer mapping of 355-nm absorption in HfO2 monolayers using a recently developed
photothermal heterodyne imaging technique. Comparison of absorption maps with spatial distribution of UV pulsed-laser-
induced damage morphology allows one to better estimate the size and densities of nanoscale absorbing defects in
hafnia thin films. Possible defect-formation mechanisms are discussed.
S. Papernov,A. Tait,W. Bittle,A. W. Schmid,J. B. Oliver, andP. Kupinski
"Submicrometer-resolution mapping of ultraweak 355-nm absorption
in HfO2 monolayers using photothermal heterodyne imaging", Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 78420A (30 November 2010); https://doi.org/10.1117/12.868236
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S. Papernov, A. Tait, W. Bittle, A. W. Schmid, J. B. Oliver, P. Kupinski, "Submicrometer-resolution mapping of ultraweak 355-nm absorption in HfO2 monolayers using photothermal heterodyne imaging," Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 78420A (30 November 2010); https://doi.org/10.1117/12.868236