Rigorous simulations of 3D patterns on extreme ultraviolet lithography masks

Sven Burger; Lin Zschiedrich; Jan Pomplun; Frank Schmidt

doi:10.1117/12.889831

23 May 2011 Rigorous simulations of 3D patterns on extreme ultraviolet lithography masks

Sven Burger, Lin Zschiedrich, Jan Pomplun, Frank Schmidt

Proceedings Volume 8083, Modeling Aspects in Optical Metrology III; 80831B (2011) https://doi.org/10.1117/12.889831
Event: SPIE Optical Metrology, 2011, Munich, Germany

Abstract

Simulations of light scattering off an extreme ultraviolet lithography mask with a 2D-periodic absorber pattern are presented. In a detailed convergence study it is shown that accurate results can be attained for relatively large 3D computational domains and in the presence of sidewall-angles and corner-roundings.

Citation Download Citation

Sven Burger, Lin Zschiedrich, Jan Pomplun, and Frank Schmidt "Rigorous simulations of 3D patterns on extreme ultraviolet lithography masks", Proc. SPIE 8083, Modeling Aspects in Optical Metrology III, 80831B (23 May 2011); https://doi.org/10.1117/12.889831

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