Introduction of an innovative water based photoresist stripping process using intelligent fluids

Matthias Rudolph; Xaver Thrun; Dirk Schumann; Anita Hoehne; Silvio Esche; Christoph Hohle

doi:10.1117/12.2048068

27 March 2014 Introduction of an innovative water based photoresist stripping process using intelligent fluids

Matthias Rudolph, Xaver Thrun, Dirk Schumann, Anita Hoehne, Silvio Esche, Christoph Hohle

Proceedings Volume 9051, Advances in Patterning Materials and Processes XXXI; 90510T (2014) https://doi.org/10.1117/12.2048068
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

The usage of phasefluid based stripping agents to remove photoresists from silicon substrates was studied. Due to their highly dynamic inner structure phasefluids offer a new working principle, they are penetrating layers through smallest openings and lift off the material from the surface. These non-aggressive stripping fluids were investigated regarding their cleaning efficiency as well as contamination behavior to enable usage in semiconductor and MEMS manufacturing. A general proof of concept for the usage of phasefluids in resist stripping processes is shown on silicon coupons and BKM’s are given for different resist types. In addition a baseline process on 12inch wafers has been developed and characterized in terms of metallic and ionic impurities and defect level.

Citation Download Citation

Matthias Rudolph, Xaver Thrun, Dirk Schumann, Anita Hoehne, Silvio Esche, and Christoph Hohle "Introduction of an innovative water based photoresist stripping process using intelligent fluids", Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90510T (27 March 2014); https://doi.org/10.1117/12.2048068

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