Paper
27 March 2014 SRAF window improvement with under-coating layer
Takahiro Hiromatsu, Toru Fukui, Kenta Tsukagoshi, Kazunori Ono, Masahiro Hashimoto
Author Affiliations +
Abstract
A novel adhesion promoting material has been developed to prevent very small resist patterns from collapse. One target for the development of the material is to make an advanced negative-tone mask with 40 nm sub-resolution assist features (SRAF). The SRAF on photomasks has become shorter and shorter as well as narrowing. The 2-dimensional resist patterns easily collapse during the resist developing process. Resist under-coating material controlled the surface condition on a chrome absorber film, and it improved the resolution of the SRAF. As a result, SRAFs of 46nm width and 200nm length were achieved using the material. A negative-tone resist on the under-coating layer demonstrated 35 nm isolated line patterns on a mask without pattern collapse.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takahiro Hiromatsu, Toru Fukui, Kenta Tsukagoshi, Kazunori Ono, and Masahiro Hashimoto "SRAF window improvement with under-coating layer", Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 905120 (27 March 2014); https://doi.org/10.1117/12.2046779
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KEYWORDS
SRAF

Chromium

Etching

Photomasks

Photoresist processing

Absorption

Coating

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