Pushing the limits: latest developments in angle metrology for the inspection of ultra-precise synchrotron optics

Tanfer Yandayan; Ralf D. Geckeler; Frank Siewert

doi:10.1117/12.2060953

5 September 2014 Pushing the limits: latest developments in angle metrology for the inspection of ultra-precise synchrotron optics

Tanfer Yandayan, Ralf D. Geckeler, Frank Siewert

Author Affiliations +

Proceedings Volume 9206, Advances in Metrology for X-Ray and EUV Optics V; 92060F (2014) https://doi.org/10.1117/12.2060953
Event: SPIE Optical Engineering + Applications, 2014, San Diego, California, United States

Abstract

The requirements on the quality of ultra-precise X-ray optical components for application in the Synchrotron Radiation (SR) community are increasing continually and strongly depend on the quality of the metrology devices available to measure such optics. To meet the upcoming accuracy goal of 50 nrad rms for slope measuring profilers, a dedicated project, SIB58 Angles, consisting of 16 worldwide partners and supported by the European Metrology Research Programme (EMRP) was started in Sep 2013. The project covers investigations on autocollimators under extremely challenging measuring conditions, ray-tracing models, 2D autocollimator calibration (for the first time worldwide), determination of error sources in angle encoders providing traceability by ‘sub-division of 2π rad’ with nrad uncertainty, angle generation by 'ratio of two lengths' in nrad level, and on the development of portable precise Small Angle Generators (SAGs) for regular in-situ checks of autocollimators’ performance. Highlights from the project will be reported in the paper and the community of metrology for X-Ray and EUV Optics will be informed about its progress and the latest work in angle metrology.

Citation Download Citation

Tanfer Yandayan, Ralf D. Geckeler, and Frank Siewert "Pushing the limits: latest developments in angle metrology for the inspection of ultra-precise synchrotron optics", Proc. SPIE 9206, Advances in Metrology for X-Ray and EUV Optics V, 92060F (5 September 2014); https://doi.org/10.1117/12.2060953

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