A Compact Optical Imaging System For Resist Process And Lithography Research

John H. Bruning; William Oldham

doi:10.1117/12.968448

1 January 1988 A Compact Optical Imaging System For Resist Process And Lithography Research

John H. Bruning, William Oldham

Proceedings Volume 0922, Optical/Laser Microlithography; (1988) https://doi.org/10.1117/12.968448
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

A compact small field 20:1 reduction optical imaging system has been developed to provide a stable platform for printing submicron lithographic images at 248nm in resist without the cost and complexity of production equipment. The target applications are those in the areas of process development for resists in UV and deep UV and R&D laboratories and universities doing image science. In all of these applications, the normal issues of production lithography such as throughput, field size, automated substrate handling, etc. are unimportant. A simple bench top lithography system without these production oriented constraints is described.

Citation Download Citation

John H. Bruning and William Oldham "A Compact Optical Imaging System For Resist Process And Lithography Research", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); https://doi.org/10.1117/12.968448

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