Paper
11 September 2015 Influence of substrate type on structure of C-Pd thin films
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Proceedings Volume 9662, Photonics Applications in Astronomy, Communications, Industry, and High-Energy Physics Experiments 2015; 96624M (2015) https://doi.org/10.1117/12.2205854
Event: XXXVI Symposium on Photonics Applications in Astronomy, Communications, Industry, and High-Energy Physics Experiments (Wilga 2015), 2015, Wilga, Poland
Abstract
C-Pd films were obtained by a two steps’ PVD/CVD method (Physical Vapor Deposition/Chemical Vapor Deposition). Investigations of Pd nanograins structure and carbon matrix structure were performed. Many types of substrates (Si, Si covered with DLC layer, Al2O3 plate and AAO membrane) with various developing specific surface area (SSA) were applied and the influence on this surface on obtained films C-Pd was studied. We present the results of Scanning Electron Microscopy (SEM) studies with SE (Secondary Electrons) and LABE (Low Angle Backscattered Electrons) modes. Depending on the substrate type it was possible to obtain many different films and structures with various structural features.
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Ewa Kowalska, Elżbieta Czerwosz, Miroslaw Kozłowski, and Piotr Firek "Influence of substrate type on structure of C-Pd thin films", Proc. SPIE 9662, Photonics Applications in Astronomy, Communications, Industry, and High-Energy Physics Experiments 2015, 96624M (11 September 2015); https://doi.org/10.1117/12.2205854
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KEYWORDS
Palladium

Scanning electron microscopy

Silicon

Carbon

Chemical vapor deposition

Hydrogen

Semiconducting wafers

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