Preparation and properties of all-solid-state inorganic thin film glass/ITO/WO3/LiNbO3/NiOx/ITO electrochromic device

Zhonghou Wu; Xungang Diao; Guobo Dong

doi:10.1117/12.2229866

26 January 2016 Preparation and properties of all-solid-state inorganic thin film glass/ITO/WO₃/LiNbO₃/NiO_x/ITO electrochromic device

Zhonghou Wu, Xungang Diao, Guobo Dong

Author Affiliations +

Proceedings Volume 9796, Selected Papers of the Photoelectronic Technology Committee Conferences held November 2015; 979612 (2016) https://doi.org/10.1117/12.2229866
Event: Selected Proceedings of the Chinese Society for Optical Engineering Conferences held November 2015, 2015, Various, China

Abstract

The all-thin-film inorganic electrochromic device (ECD) with LiNbO₃ as the ion conductor layer was prepared. The ECD was fabricated monolithically in a same vacuum chamber layer by layer using DC reactive sputtering for WO₃, NiO_x and ITO, and radio frequency (RF) sputtering for LiNbO₃. The properties and performance of WO₃ thin film and the ECD were studied through X-ray diffraction (XRD), scanning electron microscopy (SEM), and ultraviolet-visible spectrometry. WO₃ thin film has more than 60% optical modulation with porous amorphous structure. The visible transmittance modulation of the ECD is more than 65%, and the response time of coloring and bleaching are 45 s and 25 s, respectively.

Citation Download Citation

Zhonghou Wu, Xungang Diao, and Guobo Dong "Preparation and properties of all-solid-state inorganic thin film glass/ITO/WO₃/LiNbO₃/NiO_x/ITO electrochromic device", Proc. SPIE 9796, Selected Papers of the Photoelectronic Technology Committee Conferences held November 2015, 979612 (26 January 2016); https://doi.org/10.1117/12.2229866

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