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9 March 2022 Polarization modulation using exposure response coefficient in polarization holography
Jinyu Wang, Peiliang Qi, Ayuan Lin, Yuxin Chen, Lu Huang, Xianmiao Xu, Xinyi Yuan, Shujun Zheng, Tian Ye, Shenghui Ke, Yuanying Zhang, Zhiyun Huang, Xiaodi Tan
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Proceedings Volume PC12025, Ultra-High-Definition Imaging Systems V; PC1202504 (2022) https://doi.org/10.1117/12.2608598
Event: SPIE OPTO, 2022, San Francisco, California, United States
Abstract
Based on tensor polarization holography, the variation of exposure response coefficient with the increase of exposure energy under different recording process is introduced in this paper. We find that different recording processes have different effects on the exposure response coefficient. However, at the beginning of exposure, there is an initial value of the exposure response coefficient independent of the holographic recording process. With this special phenomenon, polarization modulation of reconstructed wave can be easily realized at low exposure energy, such as faithful reconstruction, orthogonal reconstruction and null reconstruction.
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Jinyu Wang, Peiliang Qi, Ayuan Lin, Yuxin Chen, Lu Huang, Xianmiao Xu, Xinyi Yuan, Shujun Zheng, Tian Ye, Shenghui Ke, Yuanying Zhang, Zhiyun Huang, and Xiaodi Tan "Polarization modulation using exposure response coefficient in polarization holography", Proc. SPIE PC12025, Ultra-High-Definition Imaging Systems V, PC1202504 (9 March 2022); https://doi.org/10.1117/12.2608598
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KEYWORDS
Dielectric polarization
Modulation
Holography
Dielectrics
Optical properties
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