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13 June 2022 Measurement methods and reference artifacts for the characterization of the SEM and its electron beam
András E. Vladár, Kerim Arat, Robert Polster
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Proceedings Volume PC12053, Metrology, Inspection, and Process Control XXXVI; PC1205309 (2022) https://doi.org/10.1117/12.2614335
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States
Abstract
Achieving and maintaining top SEM performance, ensuring excellent tool matching involves optimization of more than a couple of the attributes of the SEM. Objective instrument quality/performance assessment requires suitable measurement methods and associated reference samples. The electron probe size, shape, direction (incidence angle), are essential inputs for simulation that can be used to fully optimize measurements for speed and reliable data, and for model-based SEM measurements that provides the best, most accurate dimensional measurement results. The presentation addresses these problems by presenting suitable measurement solutions and sample designs.
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András E. Vladár, Kerim Arat, and Robert Polster "Measurement methods and reference artifacts for the characterization of the SEM and its electron beam", Proc. SPIE PC12053, Metrology, Inspection, and Process Control XXXVI, PC1205309 (13 June 2022); https://doi.org/10.1117/12.2614335
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KEYWORDS
Electron beams
Scanning electron microscopy
Optical testing
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