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30 April 2023 Novel self-assembled patterns from complex block copolymer architectures
Caroline A. Ross
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Proceedings Volume PC12497, Novel Patterning Technologies 2023; PC124970E (2023) https://doi.org/10.1117/12.2661958
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States
Abstract
The utility of block copolymers in nanofabrication and nanolithography can be enhanced by expanding the range of possible microdomain geometries available, and by developing methods to direct their self-assembly in the out-of-plane direction to make three dimensional structures. We will describe morphologies created by Si-containing triblock terpolymers, rod-coil copolymers, and bottlebrush copolymers, including zigzags, bends, junctions, tiling patterns and hierarchical structures with two independently tunable periods. Sequential self-assembly can produce three dimensional structures by assembling one block copolymer on another, including orthogonal mesh patterns. We also describe metal infiltration of block copolymers by immersion in an acid solution of a metal salt, and reversibility of the metallization by immersion in acid. Combinations of novel polymers, templating approaches, and processing techniques yield an extensive array of rectilinear and 3D pattern geometries that can ex
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Caroline A. Ross "Novel self-assembled patterns from complex block copolymer architectures", Proc. SPIE PC12497, Novel Patterning Technologies 2023, PC124970E (30 April 2023); https://doi.org/10.1117/12.2661958
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KEYWORDS
Directed self assembly
Metals
Nanofabrication
Nanolithography
Polymers
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