CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume PC12499 > Article
Presentation
30 April 2023 Ultra-low energy radical treatments for advanced 3D device structures
Seung Park, Yong Hee Choi, David Lo, Mark Kawaguchi, Christine Das
Author Affiliations +
Proceedings Volume PC12499, Advanced Etch Technology and Process Integration for Nanopatterning XII; PC124990C (2023) https://doi.org/10.1117/12.2659121
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States
Abstract
Radicals have been effectively used for photoresist removal for many decades, however, most radical treatments have an energy distribution with high energy tails. This contributes to unwanted surface change or damage of other exposed materials. Tighter energy control is needed. We propose an ultra-low energy radical treatment with sufficient energy for surface modification but also a tighter energy distribution that minimizes unwanted film damage or loss. In this method, a reactive chemistry is introduced below the plasma generation region so that reactive radicals are generated indirectly though collision with inert metastable species.
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Seung Park, Yong Hee Choi, David Lo, Mark Kawaguchi, and Christine Das "Ultra-low energy radical treatments for advanced 3D device structures", Proc. SPIE PC12499, Advanced Etch Technology and Process Integration for Nanopatterning XII, PC124990C (30 April 2023); https://doi.org/10.1117/12.2659121
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 PRESENTATION
WATCH
PRESENTATION SAVE TO MY LIBRARY
GET CITATION
Advertisement
Advertisement
KEYWORDS
3D equipment
Plasma generation
Plasma
Chemistry
Photoresist materials
Emission spectroscopy
Oxygen
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top