Latest developments of CNT based pellicles for high-power EUV lithography

Márcio D. Lima; Takahiro Ueda; Takeshi Kondo; Tetsuo Harada

doi:10.1117/12.2689034

22 November 2023 Latest developments of CNT based pellicles for high-power EUV lithography

Márcio D. Lima, Takahiro Ueda, Takeshi Kondo, Tetsuo Harada

Proceedings Volume PC12750, International Conference on Extreme Ultraviolet Lithography 2023; PC127500M (2023) https://doi.org/10.1117/12.2689034
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

In this presentation, pellicles manufactured using free-standing carbon nanotubes (CNT) films less than 20 nm thick were characterized for EUV transmission, scattering, reflectivity, mechanical properties, and capability to stand high intensity (30 W/cm2) EUV radiation in environmental conditions similar to a 600W EUV scanner. Several types of coated CNT films were also tested to increase the lifetime of the pellicles. The EUV transmissions ranged from 98% for uncoated samples to 95% for coated. Off-line scanner tests simulating hydrogen plasma conditions showed improvement of more than 3 times the lifetime of CNT pellicles by using protective layers. Also, in situ EUV measurements showed significant effects of hydrogen pressure and time on the transparency of pellicles. New protocols for measurement of mechanical deflection of porous pellicles under pumping down and venting operations were evaluated.

Conference Presentation

Citation Download Citation

Márcio D. Lima, Takahiro Ueda, Takeshi Kondo, and Tetsuo Harada "Latest developments of CNT based pellicles for high-power EUV lithography", Proc. SPIE PC12750, International Conference on Extreme Ultraviolet Lithography 2023, PC127500M (22 November 2023); https://doi.org/10.1117/12.2689034

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