MBMW-301: paving the way towards the angstrom era of mask writing lithography

Christoph Spengler; Christof Klein; Hans Loeschner; Elmar Platzgummer

doi:10.1117/12.2688204

22 November 2023 MBMW-301: paving the way towards the angstrom era of mask writing lithography

Christoph Spengler, Christof Klein, Hans Loeschner, Elmar Platzgummer

Proceedings Volume PC12751, Photomask Technology 2023; PC127510R (2023) https://doi.org/10.1117/12.2688204
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

Since IMS Nanofabrication introduced the MBMW series of multi-beam mask-writers in 2016, multi-beam technology has continued to improve and mature. Since then, multi-beam has increasingly become the standard solution for leading-edge mask patterning due to its superior writing performance on medium and low sensitivity resists, as well as its capability to pattern even the most complex curvilinear structures at maximum throughput - especially for EUV masks. Following the release of evolutionary improvements with the MBMW-201 in 2019 and the MBMW-261 in 2022, IMS Nanofabrication releases its third multi-beam tool-generation in 2023: the MBMW-301 – a tool that is aimed at the 2nm-node and High-NA EUV mask production. This presentation provides an overview of the key features of IMS Nanofabrication's latest generation of multi-beam mask-writers and discloses recent write performance results.

Conference Presentation

Citation Download Citation

Christoph Spengler, Christof Klein, Hans Loeschner, and Elmar Platzgummer "MBMW-301: paving the way towards the angstrom era of mask writing lithography", Proc. SPIE PC12751, Photomask Technology 2023, PC127510R (22 November 2023); https://doi.org/10.1117/12.2688204

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