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Field Guide to Optical Lithography
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Description
The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry.
Keywords: semiconductor, lithography, photoresist, critical dimension, RET, photomasks, Moore's law, photoresists, microlithography
Table of Contents
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Front Matter
Open Access
- The Lithography Process
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Definition: Semiconductor Lithography
- Image Formation
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Maxwell's Equations: The Mathematics of Light
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Diffraction
Open Access
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The Numerical Aperture
Open Access
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Fourier Optics
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Partial Coherence
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Aberrations
Open Access
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Polarization
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Immersion Lithography: Resolution
Open Access
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Immersion Lithography: Depth of Focus
Open Access
- Imaging into a Photoresist
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Standing Waves: Definition
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Swing Curves
- Photoresist Chemistry
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Novolak/DNQ Resists
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Exposure Kinetics
- Lithography Control and Optimization
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NILS: The Normalized Image Log-Slope
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Overlay Control
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Depth of Focus
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Resolution
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Resolution Enhancement Technologies
Open Access
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Phase-Shift Masks
Open Access
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Phase-Shift Masks: Alternating
Open Access
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Phase-Shift Masks: Attenuated
Open Access
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Moore's Law
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Equation Summary
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Back Matter
Open Access
Excerpt
The material in this Field Guide to Optical Lithography is a distillation of material I have been putting together for the last 20 years or so. I have been subjecting students in my graduate-level lithography course at the University of Texas at Austin to my disorganized notes for 14 years, and have published some similar material in my first book Inside PROLITH and my column in Microlithography World called “The Lithography Expert.” However, the challenge here was not in creating the material for the book but rather deciding what material to leave out and how to make what remained as condensed as possible. As people who know me can attest, I am rarely lacking for words and brevity is not my strong suit (I am a lousy poet). I hope, however, that the kind reader will forgive me when one page on a topic of interest does not satisfy—it is an unavoidable consequence of the Field Guide format, and my own limitations as an overly verbose writer.
I thank Jeff Byers, William Howard, and Rob Jones for their help in reviewing the draft manuscript of this Field Guide. My many mistakes kept them quite busy.
This Field Guide is dedicated to my wife Susan and our daughter Sarah, who have taught me that there is indeed something more fun in this world than lithography.
Chris Mack
chris@lithoguru.com
©2006 Society of Photo-Optical Instrumentation Engineers
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